Intel is the first to have High NA EUV machinery for advanced chip manufacturing

Intel already has specific machinery in its chip manufacturing facilities. High NA EUV lithographybeing the first in the industry to have this technology for the manufacture of chips on a commercial scale. The specific machinery, a lithographic scanner, is located in the Hillsboro, Oregon facility, and is manufactured by the main developer of this type of systems for the creation of advanced chips: ASML. The company has already achieved the milestone of being the first to create lines with High NA EUV technology of just 10 nanometers.

The technology High NA EUV It will allow the company to improve manufacturing capabilities in future advanced processes that arrive after the Intel 18A process. Intel hopes to take advantage of it in large-scale chip manufacturing starting in the second half of this decade, that is, starting in 2025.

This means the use of this technology in the new Next-generation Intel 14A and 14A-E processes.

Intel assures that this technology High NA EUV (0.55NA EUV) It will allow greater image contrast, allowing the use of less light for each exposure in the lithography process, to achieve a reduction in manufacturing time compared to the current 0.33NA EUV technology.

Specifically, the company intends to achieve the printing of elements on the chips 1.7 times smaller than today, with a density 2.9 times higher.

The technology High NA EUV from Intel It will only be used, at least initially, in critical parts of the chip where immediate benefits can be obtained and bottlenecks avoided.

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